イオン注入を利用した格子緩和SiGe薄膜の作製

2005.10 - 2006.9

難黒鉛化性フラン樹脂炭素の表面黒鉛化

2001.4 - 2002.3

新規太陽電池材料BaSi2の近接蒸着による成膜技術開発 Reviewed

原 康祐、山中 淳二、有元 圭介

表面と真空   2433-5835   388 - 392   2023.7( ISSN：2433-5835 )

Influences of lattice strain and SiGe buffer layer thickness on electrical characteristics of strained Si/SiGe/Si(110) heterostructures Reviewed

Taisuke Fujisawa, Atsushi Onogawa, Miki Horiuchi, Yuichi Sano, Chihiro Sakata, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa, Keisuke Arimoto

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING   161   107476-1 - 107476-7   2023.7( ISSN：1369-8001 )

Crystalline Morphology of SiGe Films Grown on Si(110) Substrates Reviewed Major achievement

Keisuke Arimoto, Chihiro Sakata, Kosuke O. Hara, Junji Yamanaka

JOURNAL OF ELECTRONIC MATERIALS   52   5121 - 5127   2023.4( ISSN：0361-5235 )

Semiconducting BaSi2 film synthesis by close-spaced evaporation benefiting from mechanical activation of source powder by ball milling Reviewed

Kosuke O. Hara, Chiaya Yamamoto, Junji Yamanaka, and Keisuke Arimoto

JJAP Conference Proceedings   10   011101-1 - 011101-5   2023.4( ISSN：2758-2450 )

Constructing the composition ratio prediction model using machine learning for BaSi2 thin films deposited by thermal evaporation Reviewed Major achievement

Ryuto Ueda, Keisuke Arimoto, Junji Yamanaka, and Kosuke O. Hara

Japanese Journal of Applied Physics   62   SK1011   2023.4( ISSN：1347-4065 )

Evaluation of Lattice-Spacing of SiGe/Si by NBD using Two-condenser-lens TEM Reviewed Major achievement

Junji Yamanaka, Takuya Oguni, Yuichi Sano, Yusuke Ohshima, Atsushi Onogawa, Kosuke O. Hara, Keisuke Arimoto

MICROSCOPY AND MICROANALYSIS   28 ( S1 )   2812 - 2813   2022.7( ISSN：1431-9276 )

Discrimination between Coherent and Incoherent Interfaces using STEM Moiré Reviewed Major achievement

Junji Yamanaka, Daisuke Izumi, Chiaya Yamamoto, Mai Shirakura, Kosuke Hara, Keisuke Arimoto

MICROSCOPY AND MICROANALYSIS   27 ( Supplement S1 )   2326 - 2327   2021.8( ISSN：1431-9276 )

Engineering Strain, Defects, and Electronic Properties of (110)-Oriented Strained Si Invited Reviewed

K. Arimoto, J. Yamanaka, K. O. Hara, K. Sawano, N. Usami, K. Nakagawa

ECS Transactions   98 ( 5 )   277 - 290   2020.10( ISSN：1938-6737  eISSN：1938-5862 )

Interface reaction of the SnS/BaSi2 heterojunction fabricated for solar cell applications Reviewed

Kosuke O. Hara, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa

THIN SOLID FILMS   706   138064   2020.7( ISSN：0040-6090 )

HREM Observation and Identification of the Causality of Twins in SiGe/Si (110) Reviewed Major achievement

Junji Yamanaka, Yuichi Sano, Shingo Saito, Atsushi Onogawa, Kosuke O. Hara, Kiyokazu Nakagawa, Keisuke Arimoto

MICROSCOPY AND MICROANALYSIS   26 ( supplement 2 )   2020.7( ISSN：1431-9276 )

Hole mobility in Strained Si/Relaxed SiGe/Si(110) hetero structures studied by gated Hall measurements Reviewed

Daichi Namiuchi, Atsushi Onogawa, Taisuke Fujisawa, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa, Keisuke Arimoto

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING   113   2020.3( ISSN：1369-8001 )

Reactive deposition growth of highly (001)-oriented BaSi2 films by close-spaced evaporation Reviewed

Kosuke O. Hara, Shuhei Takizawa, Junji Yamanaka, Noritaka Usami, Keisuke Arimoto

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING   113   2020.3( ISSN：1369-8001 )

Strain relaxation process and evolution of crystalline morphologies during the growths of SiGe on Si(110) by solid-source molecular beam epitaxy Reviewed

Shingo Saito, Yuichi Sano, Takane Yamada, Kosuke O. Hara, Junji Yamanaka, Kiyokazu Nakagawa, Keisuke Arimoto

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING   113   2020.3( ISSN：1369-8001 )

Hole mobility enhancement observed in (110)-oriented strained Si Reviewed

Kosuke O. Hara, Keisuke Arimoto, Junji Yamanaka, and Kiyokazu Nakagawa

JAPANESE JOURNAL OF APPLIED PHYSICS   59   2020.2( ISSN：0021-4922 )

Thermodynamic analyses of thermal evaporation of BaSi2 Reviewed

Kosuke O. Hara, Keisuke Arimoto, Junji Yamanaka, and Kiyokazu Nakagawa

JAPANESE JOURNAL OF APPLIED PHYSICS   59   2020.1( ISSN：0021-4922 )

Evaluation of Crystal Lattice Rotation around a Stress-Induced Twin in a Step-Graded SiGe / Si (110) Using STEM Moiré Observation and its Image Analysis Reviewed Major achievement

Junji Yamanaka, Chiaya Yamamoto, Mai Shirakura, Kosuke O. Hara, Keisuke Arimoto, Kiyokazu Nakagawa, Akimitsu Ishizuka, and Kazuo Ishizuka

MICROSCOPY AND MICROANALYSIS   25 ( S2 )   242 - 243   2019.8( ISSN：1431-9276 )

Relaxation of strain in Si layers formed on (110)-oriented SiGe/Si heterostructures Reviewed

Keisuke Arimoto, Atsushi Onogawa, Shingo Saito, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O Hara and Kiyokazu Nakagawa

　   93   79 - 80   2019.6

Fabrication of SnS/BaSi2 heterojunction by thermal evaporation for solar cell　applications Reviewed

Kosuke O. Hara , Keisuke Arimoto, Junji Yamanaka, and Kiyokazu Nakagawa

JAPANESE JOURNAL OF APPLIED PHYSICS   58   SBBF01-1 - SBBBF01-5   2019.1( ISSN：0021-4922 )

Environmentally-friendly fabrication of organic field-effect transistors based on small molecule/polymer blend prepared by electrostatic spray deposition Reviewed

Syunsuke Obata, Yuta Miyazawa, Junji Yamanaka and Norio Onojima

JAPANESE JOURNAL OF APPLIED PHYSICS   58   SBBG02-1 - SBBG02-6   2019.1( ISSN：0021-4922 )

Stability of strain in Si layers formed on SiGe/Si(110) heterostructures Reviewed

Keisuke Arimoto, Atsushi Onogawa, Shingo Saito, Takane Yamada, Kei Sato, Naoto Utsuyama, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O Hara, Kentarou Sawano and Kiyokazu Nakagawa

Semiconductor Science and Technology   33 ( 12 )   124016-1 - 124016-8   2018.11

CaxBa1–xNb2O6 Ferroelectric Nanopowders for Ultrahigh-Density Optical Data Storage Reviewed

Mirza H. K. Rubel, M. S. Islam, U. S. M. Mahmuda, M. M. Rahaman, M. E. Hossain, M. S. Parvez, K. M. Hossain, M. I. Hossain, J. Hossain, Jiyunji Yamanaka, Nobuhiro Kumada, and S. Kojima

ACS Applied Nano Materials   1 ( 11 )   6289 - 6300   2018.10

Diffusion process in BaSi2 film formation by thermal evaporation and its relation to electrical properties Invited Reviewed

Kosuke O. Hara, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa

Journal of Materials Research   33   2297 - 2305   2018.9

Formation of uniaxial strained Ge via control of dislocation alignment in Si/Ge heterostructures Reviewed

Shiori Konoshima, Eisuke Yonekura, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, and Kentarou Sawano

AIP Advances   8   075112-1 - 075112-5   2018.7( ISSN：2158-3226 )

BaSi2 formation mechanism in thermally evaporated films and its application to reducing oxygen impurity concentration Reviewed

Kosuke O. Hara, Chiaya Yamamoto, Junji Yamanaka, Keisuke Arimoto, Kiyokazu Nakagawa, and Noritaka Usami

JAPANESE JOURNAL OF APPLIED PHYSICS   2018.2( ISSN：0021-4922 )

Suppression of Near-interface Oxidation in Thermally-evaporated BaSi2 Films and Its Effects on Preferred Orientation and the Rectification Behavior of n-BaSi2/p+-Si Diodes Reviewed

Kosuke O. Hara, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa and Noritaka Usami

　   2018.1

Sharp phase-separated interface of 6,13-bis(triisopropylsilylethynyl) pentacene/polystyrene blend films prepared by electrostatic spray deposition Reviewed

Norio Onojima, Takumi Ozawa, Takuya Sugai, Shunsuke Obata, Yuta Miyazawa, Junji Yamanaka

ORGANIC ELECTRONICS   66   206 - 210   2018( ISSN：1566-1199 )

Investigation on the origin of preferred a-axis orientation of BaSi2 films deposited on Si(100) by thermal evaporation Reviewed

Kosuke O. Hara, Chiaya Yamamoto, Junji Yamanaka, Keisuke Arimoto, Kiyokazu Nakagawa, Noritaka Usami

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING   2017.12( ISSN：1369-8001 )

Fabrication of high-quality strain relaxed SiGe(1 1 0) films by controlling defects via ion implantation Reviewed

M. Kato, K. Arimoto, J. Yamanaka, K. Nakagawa, K. Sawano

JOURNAL OF CRYSTAL GROWTH   477   197 - 200   2017.11( ISSN：0022-0248 )

Growth of strained Si/relaxed SiGe heterostructures on Si(110) substrates using solid-source molecular beam epitaxy Reviewed

Keisuke Arimoto, Hiroki Nakazawa, Shohei Mitsui, Naoto Utsuyama, Junji Yamanaka, Kosuke O Hara, Noritaka Usami and Kiyokazu Nakagawa

SEMICONDUCTOR SCIENCE AND TECHNOLOGY   32   114002   2017.11( ISSN：0268-1242 )

Thermal stability of compressively strained Si/relaxed Si1-xCx heterostructures formed on Ar ion implanted Si (100) substrates Reviewed

You Arisawaa,⁎, Yusuke Hoshib, Kentarou Sawanoc, Junji Yamanakad, Keisuke Arimotod, Chiaya Yamamotoe,f, Noritaka Usamia

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING   2017.11( ISSN：1369-8001 )

Fabrication of BaSi2 thin films capped with amorphous Si using a single evaporation source Reviewed

Kosuke O. Hara, Cham Thi Trinh, Yasuyoshi Kurokawa, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, Noritaka Usami

THIN SOLID FILMS   636   546 - 551   2017.8( ISSN：0040-6090 )

Hole mobility in strained Si/SiGe/vicinal Si(110) grown by gas source MBE Reviewed

Keisuke Arimotoa, Sosuke Yagi, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Noritaka Usami, Kiyokazu Nakagawa

JOURNAL OF CRYSTAL GROWTH   468   625 - 629   2017.6( ISSN：0022-0248 )

Hole generation associated with intrinsic defects in SOI-based SiGe thin films formed by solid-source molecular beam epitaxy Reviewed

Motoki Satoh, Keisuke Arimoto, Junji Yamanaka, Kentarou Sawano, Yasuhiro Shiraki, Kiyokazu Nakagawa

JOURNAL OF APPLIED PHYSICS   123   161529-1 - 161529-6   2017.4( ISSN：0021-8979 )

Effects of deposition rate on the structure and electron density of evaporated BaSi2 films, " to be published in Journal of Applied Physics Reviewed

K. O. Hara,Cham Thi Trinh,K. Arimoto,J. Yamanaka,K. Nakagawa,Y. Kurokawa,T. Suemasu,N. Usami

JOURNAL OF APPLIED PHYSICS   120 ( 4 )   2016.12( ISSN：0021-8979 )

Structural and electrical properties of Ge(111) films grown on Si(111) substrates and application to Ge(111)-on-Insulator Reviewed

K. Sawano, Y. Hoshi, S. Kubo, K. Arimoto, J. Yamanaka, K. Nakagawa, K. Hamaya, M. Miyao, Y. Shiraki

Thin Solid Films   613   24 - 28   2016.8

Control of electrical properties of BaSi2 thin films by alkali-metal doping using alkali-metal fluorides Reviewed

Kosuke O. Hara,Weijie Du,Keisuke Arimoto,Junji Yamanaka,Kiyokazu Nakagawa,Kaoru Toko,Takashi Suemasu,Noritaka Usami

Thin Solid Films   603   218 - 223   2016.3

Formation of compressively-strained Si/Si1-xCx heterostructures on Si (100) substrates with Ar ion implantation Reviewed

Japanese Journal of Applied Physics   55 ( 3 )   2016.2

Structral and electrical characterization of crack-free BaSi2 thin films fabricated by thermal evaporation Reviewed

Kosuke O. Hara,Junji Yamanaka,Keisuke Arimoto,Kiyokazu Nakagawa,Takashi Suemasu,Noritaka Usami

Thin Solid Films   595A   68 - 72   2015.11

Role of low-energy ion irradiation in the formation of aluminum germanate layer on germanium substrate by radical-enhanced atomic layer deposition Reviewed

J. Vac. Sci. Technol. A   34 ( 2 )   2015.4

Low nickel germanide contact resistances by carrier activation enhancement techniques for germanium CMOS application Reviewed

Jpn. J. Appl. Phys   ５３   2014.12

Formation of Ge(111) on Insulator by Ge epitaxy on Si(111) and layer transfer Reviewed

Thin Solid Films   557   76 - 79   2014.4

Gas-source MBE growth of strain-relaxed Si1−xCx on Si(100) substrates Reviewed

Journal of Crystal Growth   378 ( 1 )   212 - 217   2013.9

Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen Reviewed

Appl. Phys. Lett.   102 ( 13 )   2013.4

Reflectance anisotropies of compressively strained Si grown on vicinal Si1-xCx (001) Reviewed

Appl. Phys. Lett.   102   01190   2013.1

Formation of compressively strained Si/Si1-xCx/Si(100) heterostructures using gas-source molecular beam epitaxy Reviewed

J. Cryst. Growth   362 ( 1 )   276 - 281   2013.1

Formation of compressively strained SiGe/Si(110) heterostructures and their characterization Reviewed

Journal of Crystal Growth   362 ( 1 )   282 - 287   2013.1

Acceptor-Like States in SiGe Alloy Related to Point Defects Induced by Siþ Ion Implantation Reviewed

Jpn. J. Appl. Phys.   51   2012.10

電析Pd-Ni-P金属ガラス薄膜の作製と皮膜組成に及ぼす浴組成の影響 Reviewed

望月　千裕,千賀　祟史,山中　淳二,柴田　正実

表面技術   63 ( 5 )   323 - 328   2012.5

Microstructure Change of B2 Precipitates in an Fe-Al-Ni Alloy Due to Two-Step Heat-Treatment Reviewed Major achievement

Mater. Sci. Forum   706-709 ( 4 )   2496 - 2501   2012.3

Vitreous phase coating on glaserite-type alkaline earth silicate blue phosphor BaCa2MgSi2O8:Eu2+ Reviewed

Journal of Alloys and Compounds   509   8738 - 8741   2011.6

PHASE-SEPARATION OF B2 PRECIPITATES IN AN Fe-Ni-Al ALLOY Reviewed Major achievement

Materials Science Forum   638-642   2274 - 2278   2010.6

Strain relaxation mechanisms in compositionally uniform and step-graded SiGe films grown on Si(110) substrates Reviewed

K. Arimoto,M. Watanabe,J. Yamanaka,K. Nakagawa,K. Sawano,その他3名

Solid-State Electronics   53   1135 - 1143   2009.10

Topography-sensitive copper deposition in supercritical solutions Reviewed

Eiichi Kondoh,K. Nagano,C. Yamamoto,J. Yamanaka

Microelectronic Engineering   86   902 - 905   2009.4

Crystalline morphologies of step-graded SiGe layers grown on exact and vicinal (110) Si substrates Reviewed Major achievement

K. Arimoto,M. Watanabe,J. Yamanaka,K. Nakagawa,K. Sawano,その他3名

J. Cryst. Growth   331   809 - 813   2009.1

Strain relaxation mechanisms in step-graded SiGe/Si(110) heterostructures grown by gas-source MBE at high temperatures Reviewed

K. Arimoto,M. Watanabe,J. Yamanaka,K. Nakagawa,N. Usami,その他3名

J. Cryst. Growth   331   819 - 824   2009.1

Structural and transport properties of strained SiGe grown on V-groove patterned substrates Reviewed

Structural and transport properties of strained SiGe grown on V-groove patterned substrates

J. Cryst. Growth   331   814 - 818   2009.1

Growth temperature dependence of the defect morphology in SiGe films grown on Si(110) substrates with step-graded buffer Reviewed

Keisuke Arimoto,Masato Watanabe,Junji Yamanaka,Kiyokazu Nakagawa,Kentarou Sawano,その他3名

Thin Solid Films   235 - 238   2008.11

Characterizations of Polycrystalline SiGe Films on SiO2 Grown by Gas-Source Molecular Beam Deposition Reviewed

M. Mitsui,M. Tamoto,K. Arimoto,J. Yamanaka,K. Nakagawa,その他4名

Thin Solid Films   517   254 - 256   2008.11

Fabrication of high quality SiGe relaxed thin layers by ion implantation technique with Ar, Si and Ge ions Reviewed

K. Sawano,A. Fukumoto,Y. Hoshi,J. Yamanaka,K. Nakagawa,その他1名

Thin Solid Films   517   87 - 89   2008.11

Microstructure difference of Ni induced poly-crystallized SiGe by changing annealing atmosphere, and enhancement of Ni induced poly-crystallization of Si by Ar ion-implantation Reviewed Major achievement

J. Yamanaka,T. Horie,M. Mitsui,K. Arimoto,K. Nakagawa,その他5名

Thin Solid Films   517   232 - 234   2008.11

Femtosecond laser irradiation of metal and thermal oxide layers on silicon: studies utilising cross-sectional transmission electron microscopy Reviewed Major achievement

T. H. R. Crawford,J. Yamanaka,E. M. Hsu,G. A. Botton,H. K. Haugen

Appl. Phys. A   91 ( 3 )   473 - 478   2008.6

High-resolution observations of an amorphous layer and subsurface damage formed by femtosecond laser irradiation of silicon Reviewed Major achievement

T. H. R. Crawford,J. Yamanaka,G. A. Botton,H. K. Haugen

J. Appl. Phys.   103 ( 5 )   1 - 7   2008.3

New Structure of Polycrystalline Silicon Thin-Film Transistor with Germanium Layer in Source/Drain Regions for Low-Temperature Device Fabrication Reviewed

Minoru Mitsui,Keisuke Arimoto,Junji Yamanaka,Kiyokazu Nakagawa,Kentarou Sawano,その他1名

Jpn. J. Appl. Phys.   47 ( 3 )   1547 - 1549   2008.3

Strained Si n-channel metal-oxide-semiconductor field-effect transistors formed on very thin SiGe relaxed layer fabricated by ion implantation technique Reviewed

K. Sawano,A. Fukumoto,Y. Hoshi,Y. Shiraki,J. Yamanaka,その他1名

APPLIED PHYSICS LETTERS   90 ( 20 )   1 - 3   2007.5

Observation of voids formed by annealing in LiNbO3 implanted with Cu ions Reviewed Major achievement

K. Ijima,N. Mitsui,A. Ho,J. Yamanaka,S. Taniguchi,その他1名

Nuclear Instruments and Methods in Physics Research B   257   472 - 475   2007.4

Growth temperature dependence of lattice structures of SiGe/graded buffer structures grown on Si(1 1 0) substrates by gas-source MBE Reviewed

Keisuke Arimoto,Junji Yamanakaa,Kiyokazu Nakagawaa,Kentarou Sawanob,Yasuhiro Shirakib,その他2名

Journal of Crystal Growth   301-302   343 - 348   2007.4

Nano-Sized Ni Particles on Hollow Alumina Ball; Catalysts for Hydrogen Production Reviewed

Masahiro Watanabe,Hisao Yamashita,Xin Chen,Junji Yamanaka,Masashi Kotobuki,Hiroaki Suzuki,Hiroyuki Uchida

Applied Catalysis B: Environmental   71 ( 3-4 )   237 - 245   2007.2

Influence of Ge atoms on mobility and junction properties of thin-film transistors fabricated on solid-phase crystallized poly-SiGe Reviewed

Minoru Mitsui,Keisuke Arimoto,Junji Yamanaka,Kiyokazu Nakagawa,Kentarou Sawano,Yasuhiro Shiraki

Appl. Phys. Lett.   89   1 - 3   2006.11

Dislocation distribution in a strain-relaxed SiGe thin film grown on an ion-implanted Si substrate Reviewed Major achievement

Junji Yamanaka,Kentaro Sawano,Kumiko Suzuki,Kiyokazu Nakagawa,Yusuke Ozawa,その他2名

Thin Solid Films   508   103 - 106   2006.6

Formation of microcrystalline Silicon and SiNx films by electronbeam-induced-chemical vapor deposition at ultra low temperature Reviewed

Tetsuya Sato,Minoru Mitsui,Junji Yamanaka,Kiyokazu Nakagawa,Yutaka Aoki,その他2名

Thin Solid Films   508   61 - 64   2006.6

Determination of Lattice Parameters of strained-Si/SiGe Heterostructures　Grown on Si(110) Substrates Reviewed

Keisuke Arimoto,Junji Yamanaka,Kiyokazu Nakagawa,Kentarou Sawano,Yasuhiro Shiraki,その他2名

Thin Solid Films   508   132 - 135   2006.6

Lamellar nanocomposites based on exfoliated SbP2O−8 nanosheets and ionic polyacetylenes Reviewed

G.K. Prasad,N. Kumada,J. Yamanaka,Y. Yonesaki,T. Takei,その他1名

Journal of Colloid and Interface Science   297   654 - 659   2006.5

Strain-field evaluation of strain-relaxed thin SiGe layers fabricated by ion-implantation method Reviewed

Kentarou Sawano,Yusuke Ozawa,Atsushi Fukumoto,Yasuhiro Shiraki,Junji Yamanaka,その他4名

Jpn. J. Appl. Phys.   44   L1316 - L1319   2005.12

Preparation and crystal structure of H-BaTa2O6-type K1.83Ba4.17Nb12.18O36 and dielectric properties of the related compounds Reviewed

W. Zhang,N. Kumada,T. Takei,J. Yamanaka,N. Kinomura

Materials Research Bulletin   40   1177 - 1186   2005.12

Changes in Elastic Deformation of Strained Si by Micro-Fabrication Reviewed

Keisuke Arimoto,Daisuke Furukawa,Junji Yamanaka,Kiyokazu Nakagawa,Kentarou Sawano,Shinji Koh,Yasuhiro Shiraki,Noritaka Usami

Materials Science in Semiconductor Processing   8   181 - 185   2005.6

Observation of Dislocations in Strain-Relaxed Silicon-Germanium Thin Films with Flat Surfaces Grown on Ion-Implanted Silicon Substrates Reviewed Major achievement

Junji Yamanaka,Kentaro Sawano,Kiyokazu Nakagawa,Kumiko Suzuki,Yusuke Ozawa,Shinji Koh,Takeo Hattori,Yasuhiro Shiraki

Materials Science in Semiconductor Processing   7   389 - 392   2004.12

Fabrication of high-quality strain-relaxed thin SiGe layers on ion-implanted Si substrates Reviewed

K. Sawano,S. Koh,Y. Shiraki,Y. Ozawa,T. Hattori,J. Yamanaka,K. Suzuki,K. Arimoto,K. Nakagawa,N. Usami

APPLIED PHYSICS LETTERS,   85 ( 13 )   2514 - 2516   2004.11

Strain Relaxation and Induced Defects in SiGe Thin Films Grown on Ion-Implanted Si Substrates Reviewed Major achievement

Junji Yamanaka,Kentaro Sawano,Kiyokazu Nakagawa,Kumiko Suzuki,Yusuke Ozawa,Shinji Koh,Takeo Hattori,Yasuhiro Shiraki

Material Transactions   45 ( 8 )   2644 - 2646   2004.8

高分解能透過電子顕微鏡法と回折コントラスト像による無機材料のナノ構造観察

山中淳二

山梨大学機器分析センター年報2002年度版   38 - 46   2004.4

Enhancement of Strain Relaxation of SiGe Thin Layers by Pre-Ion-Implantation into Si Substrates Reviewed

K. Sawano,Y. Hirose,Y. Ozawa,S. Koh,J. Yamanaka,K. Nakagawa,T. Hattori,Y. Shiraki

Jpn. J. Appl. Phys.   42   L735 - L737   2003.7

高分解能透過電子顕微鏡法と電子エネルギー損失分光法によるフラン樹脂炭素の微細組織観察

山中淳二,安田榮一,George C. Weatherly,田邊靖博

平成14年度山梨大学工学部研究報告   51   89 - 94   2003.2

Synthesis of electrochromic praseodymium-doped vanadium oxide films by molten salt electrolysis Reviewed

Yoshikazu KANEKO,Shigehiro MORI,Junji YAMANAKA

Solid State Ionics   151   35 - 39   2002.6

TEM Observations of Surface Graphitization and Interior Microstructural Changes in a Furan-Resin-Derived Carbon Reviewed

Junji Yamanaka,Eiichi Yasuda,George C. Weatherly,Yasuhiro Tanabe

Materials Research Society Symposium   1 - 6   2002.6

Single- and Multi-Pulse Femtosecond Laser Irradiation of Iron, Copper, and Aluminum Reviewed

Qiang LIU,Junji YAMANAKA,Harold K. HAUGEN,George C. WEATHERLY

SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging   27 - 29   2002.2

X-ray Double-Crystal Diffractometry of Verneuil-Grown SrTiO3 Crystals Reviewed

Jun-ich YOSHIMURA,Takeshi SAKAMOTO,Junji YAMANAKA

Jpn. J. Appl. Phys.   40 ( 11 )   6536 - 6542   2001.11

透過電子顕微鏡による無機マテリアルのナノ構造評価

山中淳二

Journal of the Society of Inorganic Materials, Japan   8 ( 11 )   601 - 606   2001.11

Hydrothermal Synthesis of Vanadium-Based Layered Compound with 1 nm Basal Spacing Reviewed Major achievement

Junji YAMANAKA,Shigehiro MORI,Yoshikazu KANEKO

Materials Transactions   42 ( 9 )   1854 - 1857   2001.9

Cross-Sectional Observation of Surface Graphitization in Furan-Resin-Derived Carbon Reviewed Major achievement

Junji YAMANAKA,Eiichi YASUDA,Hidekazu MIGITA,Yasuhiro TANABE

Materials Transactions   42 ( 9 )   1874 - 1877   2001.9

High-Resolution Electron Microscopy of a Subgrain Boundary in Strontium Titanete Single Crystal Reviewed

Junji YAMANAKA

Materials Transactions   42 ( 6 )   1131 - 1134   2001.6

Surface Graphitization of Furan-Resin-Derived Carbon Reviewed

Yasuhiro TANABE,Junji YAMANAKA,Kazuhito HOSHI,Hidekazu MIGITA,Eiichi YASUDA

Carbon   39 ( 15 )   2347 - 2353   2001.6

Preparation of La2-xSrxCuO4 Single-Crystalline Films by Infrared-Heated LPE (IR-LPE) Technique Reviewed

Isao TANAKA,Ken ASHIZAWA,Hideyoshi TANABE,Satoshi WATAUCHI,Junji YAMANAKA

Physica C   362   180 - 185   2001.4

Cage Structure Development in Furan-Resin-Derived Carbon Reviewed

Junji YAMANAKA,Eiichi YASUDA,Hidekazu MIGITA,Yasuhiro TANABE

Materials Transactions   42 ( 3 )   453 - 456   2001.3

水酸アパタイトとPb2+イオンの反応に及ぼすCa/P モル比および純度の影響 Reviewed

岡田文夫,山中淳二,湯泉正喜,阪根英人,初鹿敏明,鈴木喬

Journal of the Society of Inorganic Materials, Japan   7   435 - 440   2000.6

X-ray Topographic Observation of Lattice Defects in Heat-Treated SrTiO3 Crystals Reviewed

Jun-ichi YOSHIMURA,Junji YAMANAKA,Takeshi IWAMOTO,Shiushichi KIMURA

Materials Transactions, JIM   41 ( 5 )   559 - 562   2000.5

Characterization of Lattice Defects in Strontium Titanate Single Crystals by X-ray Topography and Transmission Electron Microscopy Reviewed

Junji YAMANAKA,Jun-ichi YOSHIMURA,Shiushichi KIMURA

Journal of Electron Microscopy   49 ( 1 )   89 - 92   2000.1

Distribution of Dislocations in SrTiO<3>Single Crystals Reviewed Major achievement

Junji YAMANAKA

Materials Transactions, JIM   40 ( 9 )   915 - 918   1999.9

Surface Analysis of Silicon Nitride Cutting Tool after Turning Gray Cast Iron Reviewed

Toshio OGASAWARA,Keizo OTANI,Yushi SHICHI,Junji YAMANAKA

Journal of the Ceramic Society of Japan   107 ( 6 )   497 - 501   1999.6

Characterisation of lattice defects in strontium titanate single crystals by X-ray topography and transmission electron microscopy Reviewed

Junji YAMANAKA,Jun-ichi YOSHIMURA,Shiushichi KIMURA

International Symposium on Hybrid Analyses for Functional Nanostructure   167 - 168   1998.9

L12型Au3Pd規則相の出現に関する実験的検討 Reviewed

山中淳二,入戸野修

日本金属学会誌   58 ( 8 )   401 - 402   1994.8

Characteristics of Microstructures of Ni-Au and Pd-Au Alloy Films Prepared by an Evaporation Method Reviewed

Junji YAMANAKA,Yoshio NAKAMURA,Osamu NITTONO

Materials Science and Engineering A   A179/A180   401 - 407   1994.4

Ni-Au合金薄膜の相分離における微細組織の特徴 Reviewed

山中淳二,入戸野修

日本金属学会誌   56 ( 9 )   1108 - 1109   1992.9

Ni 固相フラックスを用いた SiC 薄膜作製の試み

國枝慎，有元圭介，山中淳二，原康祐

第 16 回日本フラックス成長研究発表会  2022.12 

近接蒸着法を用いた CaSi₂薄膜の作製

高垣僚太，有元圭介，山中淳二，原康祐

第 16 回日本フラックス成長研究発表会  2022.12 

ミスフィット層状化合物[(SnSe)1+δ]m(NbSe2)単結晶のフラックス育成と超伝導特性の評価

周日発，長尾雅則，山本千綾，山中淳二，丸山祐樹，綿打敏司，田中功

第 16 回日本フラックス成長研究発表会  2022.12 

Constructing the composition ratio prediction model using machine learning for BaSi2 thin films deposited by thermal evaporation International conference

Ryuto Ueda, Keisuke Arimoto, Junji Yamanaka, Kosuke O. Hara

The 33rd International Photovoltaic Science and Engineering Conference (“PVSEC-33”) will be held in Nagoya Japan from 13 to 17 in November 2022.  2022.11 

NBD 回折円盤からのSiGe 面間隔測定における収束レンズ条件の影響

古屋　丞司, 有元　圭介, 小國　琢弥, 原　康祐, 山中　淳二

日本顕微鏡学会第65 回シンポジウム  2022.11 

ミスフィット層状化合物[(SnSe)1+δ]m(NbSe2)の単結晶育成と評価

周 日発、長尾 雅則、山本 千綾、山中 淳二、丸山 祐樹、綿打 敏司、田中 功

2022年第83回応用物理学会秋季学術講演会  2022.9 

歪み SiGe/Ge(111)に発生したクラックの TEM 観察

田島 滉太、山中 淳二、有元 圭介、原 康祐、我妻 勇哉、澤野 憲太郎

2022年第83回応用物理学会秋季学術講演会  2022.9 

Ge/SiO2及びSi/Ge/SiO2の低温成長とそのTEM観察

近藤 弘人、有元 圭介、原 康祐、山中 淳二

2022年第83回応用物理学会秋季学術講演会  2022.9 

Synthesis of photoconductive BaSi2 films by close-spaced evaporation International conference

Kosuke O. Hara, Chiaya Yamamoto, Junji Yamanaka, Keisuke Arimoto

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC  2022.9 

Crystalline Morphology of SiGe Films Grown on Si(110) Substrates International conference

Keisuke Arimoto, Chihiro Sakata, Kosuke O. Hara, Junji Yamanaka

19th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors  2022.8 

Evaluation of Lattice-Spacing of Si and SiGe by NBD using conventional TEM International conference

Junji Yamanaka, Takuya Oguni, Joji Furuya, Kosuke O. Hara, Keisuke

19th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors  2022.8 

Evaluation of Lattice-Spacing of SiGe/Si by NBD using Two-condenser-lens TEM International conference

Junji Yamanaka, Takuya Oguni, Yuichi Sano, Yusuke Ohshima, Atsushi Onogawa, Kosuke O. Hara, Keisuke Arimoto

Microscopy　& Microanalysis 2022  2022.8 

Mechanochemically Assisted Close-Spaced Evaporation of BaSi_2 Films International conference

Kosuke O. Hara, Chiaya Yamamoto, Junji Yamanaka, Keisuke Arimoto

APAC SILICIDE 2022, 6th Asia-Pacific Conference on Semiconducting Silicides  2022.7 

オパールの白濁原因について

高橋泰、山中淳二、有元圭介、安保拓真

2022年度宝石学会 (日本 )オンライ講演会  2022.6 

2 段集束レンズTEM を用いたNBD によるSiGe と歪Si の面間隔評価

山中淳二、小國琢弥、佐野雄一、大島佑介、各川敦史、原康祐、有元圭介

日本顕微鏡学会第78回学術講演会  2022.5 

Si/SiGe/Si(110) 内双晶分布の X 線回折と TEM による評価

坂田 千尋、有元 圭介、各川 敦史、原 康祐、山中 淳二

日本顕微鏡学会第64回シンポジウム  2021.11 

STEM-Moiré Applications to Crystalline Specimens without using High-End Microscopes International conference

Junji Yamanaka, Chiaya Yamamoto, Kosuke O. Hara, Keisuke Arimoto

2nd Canada – Japan Microscopy Societies Symposium 2021  2021.11 

2段集束レンズ TEM を用いた NBD による SiGe 面間隔評価の試行

小國 琢弥、佐野 雄一、大島 佑介、原 康祐、有元 圭介、山中 淳二

日本顕微鏡学会第64回シンポジウム  2021.11 

STEM-Moiré Applications to Crystalline Specimens without using High-End Microscopes International conference

Junji Yamanaka, Chiaya Yamamoto, Kosuke O. Hara, Keisuke Arimoto

2nd Canada – Japan Microscopy Societies Symposium 2021  2021.11 

2段集束レンズ TEM を用いた NBD による SiGe 面間隔評価の試行

小國 琢弥, 佐野 雄一, 大島 佑介, 原 康祐, 有元 圭介, 山中 淳二

日本顕微鏡学会第64回シンポジウム  2021.11 

Si/SiGe/Si(110) 内双晶分布の X 線回折と TEM による評価

坂田 千尋, 有元 圭介, 各川 敦史, 原 康祐, 山中 淳二

日本顕微鏡学会第64回シンポジウム  2021.11 

Discrimination between Coherent and Incoherent Interfaces using STEM Moiré International conference

Microscopy　& Microanalysis 2021  2021.8 

Discrimination between Coherent and Incoherent Interfaces using STEM Moiré International conference

Junji Yamanaka, Daisuke Izumi, Chiaya Yamamoto, Mai Shirakura, Kosuke Hara, Keisuke Arimoto

Microscopy & Microanalysis 2021  2021.8 

2 段集束レンズTEM を用いたNBD によるSi 面間隔評価の試行

小國琢弥、佐野雄一、原康祐、有元圭介、山中淳二

日本顕微鏡学会第77回学術講演会  2021.6 

2 段集束レンズTEM を用いたNBD によるSi 面間隔評価の試行

小國琢弥, 佐野雄一, 原康祐, 有元圭介, 山中淳二

日本顕微鏡学会第77回学術講演会  2021.6 

Dependences of the hole mobility in the strained Si pMOSFET formed on SiGe/Si(110) on strained Si Thickness and the channel direction International conference

Keisuke Arimoto, Taisuke Fujisawa, Daichi Namiuchi, Atsushi Onogawa, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa

The 8th　Asian Conference on Crystal Growth and Crystal Technology  2021.3 

Dependences of the hole mobility in the strained Si pMOSFET formed on SiGe/Si(110) on strained Si Thickness and the channel direction International conference

Keisuke Arimoto, Taisuke Fujisawa, Daichi Namiuchi, Atsushi Onogawa, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa

The 8th Asian Conference on Crystal Growth and Crystal Technology  2021.3 

Engineering Strain, Defects, and Electronic Properties of (110)-Oriented Strained Si Invited International conference

K. Arimoto, J. Yamanaka, K. O. Hara, K. Sawano, N. Usami, K. Nakagawa

ECS PRiME 2020  2020.10 

Engineering Strain, Defects, and Electronic Properties of (110)-Oriented Strained Si Invited International conference

K. Arimoto, J. Yamanaka, K. O. Hara, K. Sawano, N. Usami, K. Nakagawa

ECS PRiME 2020  2020.10 

HREM Observation and Identification of the Causality of Twins in SiGe/Si (110) International conference

Junji Yamanaka, Yuichi Sano, Shingo Saito, Atsushi Onogawa, Kosuke O. Hara, Kiyokazu Nakagawa, Keisuke Arimoto

Microscopy & Microanalysis 2020 Meeting  2020.8  Microscopy Society of America

HREM Observation and Identification of the Causality of Twins in SiGe/Si (110) International conference

Junji Yamanaka, Yuichi Sano, Shingo Saito, Atsushi Onogawa, Kosuke O. Hara, Kiyokazu Nakagawa, Keisuke Arimoto

Microscopy & Microanalysis 2020 Meeting  2020.8  Microscopy Society of America

Hole Mobility in Strained Si/Relaxed SiGe/Si(110) Hetero Structures Studied by Gated Hall Measurements International conference

Daichi Namiuchi, Atsushi Onogawa, Keisuke Arimoto, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O Hara, Kentarou Sawano, Kiyokazu Nakagawa

8th International Symposium on Control of Semiconductor Interfaces (ISCSI-8)  2019.11 

Practical Growth Processes of Silicide and Germanide Thin Films for Photovoltaic and Electronic Applications Invited International conference

Kosuke O. Hara, Shuhei Takizawa Noritaka Usami, Junji Yamanaka, Keisuke Arimoto

8th International Symposium on Control of Semiconductor Interfaces (ISCSI-8)  2019.11 

Critical Thickness of SiGe on Si(110) Substrate International conference

Shingo Saito, Yuichi Sano, Kosuke. O. Hara, Junji Yamanaka, Keisuke Arimoto, Kiyokazu Nakagawa

8th International Symposium on Control of Semiconductor Interfaces (ISCSI-8)  2019.11 

Practical Growth Processes of Silicide and Germanide Thin Films for Photovoltaic and Electronic Applications Invited International conference

Kosuke O. Hara, Shuhei Takizawa, Noritaka Usami, Junji Yamanaka, Keisuke Arimoto

8th International Symposium on Control of Semiconductor Interfaces (ISCSI-8)  2019.11 

Critical Thickness of SiGe on Si(110) Substrate International conference

Shingo Saito, Yuichi Sano, Kosuke. O. Hara, Junji Yamanaka, Keisuke Arimoto, Kiyokazu Nakagawa

8th International Symposium on Control of Semiconductor Interfaces (ISCSI-8)  2019.11 

Hole Mobility in Strained Si/Relaxed SiGe/Si(110) Hetero Structures Studied by Gated Hall Measurements International conference

Daichi Namiuchi, Atsushi Onogawa, Keisuke Arimoto, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O Hara, Kentarou Sawano, Kiyokazu Nakagawa

8th International Symposium on Control of Semiconductor Interfaces (ISCSI-8)  2019.11 

Close-spaced Evaporation: Scalable Technique for BaSi2 Film Deposition International conference

Kosuke O. Hara, Shuhei Takizawa, Noritaka Usami, Junji Yamanaka, Keisuke Arimoto

29th International Photovoltaic Science and Engineering Conference (PVSEC-29)  2019.11 

Close-spaced Evaporation: Scalable Technique for BaSi2 Film Deposition International conference

Kosuke O. Hara, Shuhei Takizawa, Noritaka Usami, Junji Yamanaka, Keisuke Arimoto

29th International Photovoltaic Science and Engineering Conference (PVSEC-29)  2019.11 

Hole Mobility Enhancement Observed in (110)-Oriented Strained Si International conference

Keisuke Arimoto, Naoto Utsuyama, Shohei Mitsui, Kei Satoh, Takane Yamada, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa

2019 International Conference on Solid State Devices and Materials (SSDM2019)  2019.9 

Hole Mobility Enhancement Observed in (110)-Oriented Strained Si International conference

Keisuke Arimoto, Naoto Utsuyama, Shohei Mitsui, Kei Satoh, Takane Yamada, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa

2019 International Conference on Solid State Devices and Materials (SSDM2019)  2019.9 

Evaluation of Crystal Lattice Rotation around a Stress-Induced Twin in a Step-Graded SiGe / Si (110) Using STEM Moiré Observation and its Image Analysis International conference

Junji Yamanaka, Chiaya Yamamoto, Mai Shirakura, Kosuke O. Hara, Keisuke Arimoto, Kiyokazu Nakagawa, Akimitsu Ishizuka, and Kazuo Ishizuka

M&M2019 Microscopy & Microanalysis  2019.8 

Evaluation of Crystal Lattice Rotation around a Stress-Induced Twin in a Step-Graded SiGe / Si (110) Using STEM Moiré Observation and its Image Analysis International conference

Junji Yamanaka, Chiaya Yamamoto, Mai Shirakura, Kosuke O. Hara, Keisuke Arimoto, Kiyokazu Nakagawa, Akimitsu Ishizuka, Kazuo Ishizuka

M&M2019 Microscopy & Microanalysis  2019.8 

SURFACE OXIDATION OF TI PLATES BY USING MICROWAVE PLASMA HEATING SYSTEM International conference

J. Yamanaka, M. Shirakura, Y. Miyazawa, S. Shinozuka, M. Katsumata, T. Takamatsu, T. Arai, K. Nakagawa

19th International Conference on Crystal Growth and Epitaxy (ICCGE-19)  2019.7 

SURFACE OXIDATION OF TI PLATES BY USING MICROWAVE PLASMA HEATING SYSTEM International conference

J. Yamanaka, M. Shirakura, Y. Miyazawa, S. Shinozuka, M. Katsumata, T. Takamatsu, T. Arai, K. Nakagawa

19th International Conference on Crystal Growth and Epitaxy (ICCGE-19)  2019.7 

Physicochemical study of BaSi2 evaporation for composition-controlled film deposition International conference

Kosuke O. Hara, Keisuke Arimoto, Junji Yamanaka, and Kiyokazu Nakagawa

The 5th Asia-Pacific Conference on Semiconducting Silicides and Related Materials 2019 (APAC-Silicide 2019)  2019.7 

Physicochemical study of BaSi2 evaporation for composition-controlled film deposition International conference

Kosuke O. Hara, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa

The 5th Asia-Pacific Conference on Semiconducting Silicides and Related Materials 2019 (APAC-Silicide 2019)  2019.7 

Elucidating the SnS/BaSi2 Interface Reaction for SnS/BaSi2 Heterojunction Solar Cells International conference

Kosuke O. Hara, Keisuke Arimoto, Junji Yamanaka, and Kiyokazu Nakagawa

10th International Conference on Materials for Advanced Technologies (ICMAT2019)  2019.6 

Elucidating the SnS/BaSi2 Interface Reaction for SnS/BaSi2 Heterojunction Solar Cells International conference

Kosuke O. Hara, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa

10th International Conference on Materials for Advanced Technologies (ICMAT2019)  2019.6 

Relaxation of strain in Si layers formed on (110)-oriented SiGe/Si heterostructures International conference

Keisuke Arimoto, Atsushi Onogawa, Shingo Saito, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O. Hara, Kiyokazu Nakagawa

2nd Joint ISTDM / ICSI 2019 Conference  2019.6 

Relaxation of strain in Si layers formed on (110)-oriented SiGe/Si heterostructures International conference

Keisuke Arimoto, Atsushi Onogawa, Shingo Saito, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O. Hara, Kiyokazu Nakagawa

2nd Joint ISTDM / ICSI 2019 Conference  2019.6 

新しいマイクロ波プラズマ装置を用いたチタン表面の酸化

山中 淳二、白倉 麻依、宮澤 雄太、篠塚 郷貴、勝又 まさ代、高松 利行、荒井 哲司、中川 清和

日本金属学会2018年秋期講演大会  2018.9 

Formation of SnS/BaSi2 Heterojunction by Sequential Thermal Evaporation toward Solar Cell Applications International conference

K.O. Hara1, K. Arimoto, J. Yamanaka, K. Nakagawa

2018 International Conference on Solid State Devices and Materials  2018.9 

STEM Moiré Observation of the Compositionally Step-Graded SiGe Thin Film and its Image Analysis International conference Major achievement

Junji Yamanaka, Chiaya Yamamoto, Mai Shirakura, Kei Sato, Takane Yamada, Kosuke O. Hara, Keisuke Arimoto, Kiyokazu Nakagawa, Akimitsu Ishizuka, and Kazuo Ishizuka

The 19th International Microscopy Congress (IMC19)  2018.9 

STEM Moiré Observation of the Compositionally Step-Graded SiGe Thin Film and its Image Analysis International conference

Junji Yamanaka, Chiaya Yamamoto, Mai Shirakura, Kei Sato, Takane Yamada, Kosuke O. Hara, Keisuke Arimoto, Kiyokazu Nakagawa, Akimitsu Ishizuka, Kazuo Ishizuka

The 19th International Microscopy Congress (IMC19)  2018.9 

Formation of SnS/BaSi2 Heterojunction by Sequential Thermal Evaporation toward Solar Cell Applications International conference

K.O. Hara, K. Arimoto, J. Yamanaka, K. Nakagawa

2018 International Conference on Solid State Devices and Materials  2018.9 

Feasibility Study to Evaluate Lattice-Space Changing of a Step-Graded SiGe / Si (110) Using STEM Moiré International conference

The 3rd Int'l Conference on Metal Materials and Engineering (MME 2018)  2018.7 

Feasibility Study to Evaluate Lattice-Space Changing of a Step-Graded SiGe / Si (110) Using STEM Moiré International conference

The 3rd Int'l Conference on Metal Materials and Engineering (MME 2018)  2018.7 

Composition control of semiconducting BaSi2 films fabricated by thermal evaporation International conference

Kosuke O. Har, Keisuke Arimoto, Junji Yamanaka, and Kiyokazu Nakagawa

Collaborative Conference on Materials Research (CCMR) 2018  2018.6 

Composition control of semiconducting BaSi2 films fabricated by thermal evaporation International conference

Kosuke O. Har, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa

Collaborative Conference on Materials Research (CCMR) 2018  2018.6 

STEM Moiré Observations of Step-Graded SiGe/Si(110) and its lattice-space changing

2018.5 

Stability of strain in Si layers formed on SiGe/Si(110) heterostructures International conference

Keisuke Arimoto, Atsushi Onogawa, Shingo Saito, Takane Yamada, Kei Sato, Naoto Utsuyama, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa

1st Joint ISTDM / ICSI 2018 Conference  2018.5 

Stability of strain in Si layers formed on SiGe/Si(110) heterostructures International conference

Keisuke Arimoto, Atsushi Onogawa, Shingo Saito, Takane Yamada, Kei Sato, Naoto Utsuyama, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa

1st Joint ISTDM / ICSI 2018 Conference  2018.5 

Surface Roughness of SiGe/Si (110) Formed by Stress-Induced Twins and the Solution to Produce Smooth Surface International conference

Junji Yamanaka, Mai Shirakura, Chiaya Yamamoto, Naoto Utsuyama, Kei Sato, Takane Yamada, Kosuke O. Hara, Keisuke Arimoto, Kiyokazu Nakagawa

TFTA 2018 The 4th Int'l Conference on Thin Film Technology and Applications  2018.1 

A challenge to analyze slight change of lattice spacing in a compositionally step-graded SiGe thin film using STEM moiré Invited International conference

Junji Yamanaka

The 7th Conference on Nanomaterials (CN 2018)  2018.1 

Formation of Poly-Si Films on Glass Substrates by Using Microwave Plasma Heating and Fabrication of TFT’s on the Films International conference

Hiroki Nakaie, Tetsuji Arai, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, Kazuki Kamimura, Toshiyuki Takamatsu

TFTA 2018 The 4th Int'l Conference on Thin Film Technology and Applications  2018.1 

Revaluation of conventional TEM techniques and introduction of new STEM methods for materials science without using top-end microscopes Invited International conference

Junji Yamanaka

2017 Global Research Efforts on Energy and Nanomaterials (GREEN 2017)  2017.12 

Simple Thermal Evaporation Route to Single-phase and Highly-oriented BaSi2 Thin Films Invited International conference

Kosuke O. Hara1, Chiaya Yamamoto1, Junji Yamanaka1, Keisuke Arimoto1, Kiyokazu Nakagawa1, Noritaka Usami2

2017 MRS Fall Meeting  2017.11 

Simple Thermal Evaporation Route to Single-phase and Highly-oriented BaSi2 Thin Films Invited International conference

Kosuke O. Hara, Chiaya Yamamoto, Junji Yamanaka, Keisuke Arimoto, Kiyokazu Nakagawa, Noritaka Usami

2017 MRS Fall Meeting  2017.11 

DEVELOPMENT OF PREFERRED ORIENTATION IN EVAPORATED BASI2 FILMS ON SI(100) BY CONTROLLING THE NEAR-INTERFACE STRUCTURE International conference

Kosuke O. Hara1), Chiaya Yamamoto1), Junji Yamanaka1), Keisuke Arimoto1), Kiyokazu Nakagawa1), Noritaka Usami2)

PVSEC-27 The 27th International Photovoltaic Science and Engineering Conference  2017.11 

DEVELOPMENT OF PREFERRED ORIENTATION IN EVAPORATED BASI2 FILMS ON SI(100) BY CONTROLLING THE NEAR-INTERFACE STRUCTURE International conference

Kosuke O. Har, Chiaya Yamamoto, Junji Yamanaka, Keisuke Arimoto, Kiyokazu Nakagaw, Noritaka Usam

PVSEC-27 The 27th International Photovoltaic Science and Engineering Conference  2017.11 

STEM Moiré Observations of Si/SiGe/Si (110) International conference

Junji Yamanaka, Chiaya Yamamoto, Mai Shirakura, Kei Sato, Takane Yamada, Kosuke O. Hara, Keisuke Arimoto and Kiyokazu Nakagawa

The 3rd East-Asia Microscopy Conference,EAMC3  2017.11 

STEM Moiré Observations of Si/SiGe/Si (110) International conference

Junji Yamanaka, Chiaya Yamamoto, Mai Shirakura, Kei Sato, Takane Yamada, Kosuke O. Hara, Keisuke Arimoto, Kiyokazu Nakagawa

The 3rd East-Asia Microscopy Conference,EAMC3  2017.11 

Formation of Al and Hf germanate s as interlayers between high - k dielectrics and Ge substrates by radical - enhanced atomic layer deposition International conference

Daichi Yamada 1 , Yohei Otani 1 * , Chiaya Yamamoto 2 , Junji Yamanaka 3 , Tetsuya Sato 2 , Hiroshi Okamoto 4 , and Yukio Fukuda

EM-NANO 2017 The 6th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies  2017.6 

Formation of Al and Hf germanate s as interlayers between high - k dielectrics and Ge substrates by radical - enhanced atomic layer deposition International conference

Daichi Yamada, Yohei Otani, Chiaya Yamamoto, Junji Yamanaka, Tetsuya Sato, Hiroshi Okamoto, Yukio Fukuda

EM-NANO 2017 The 6th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies  2017.6 

TEM observation of Si0.99C0.01 Thin Films with Arsenic-Ion-, Boron-Ion-, and Silicon-Ion-Implantation follewd by Rapid Thermal Annealing International conference

Junji Yamanaka, Shigenori Inoue, Keisuke Arimoto, Kiyokazu Nakagawa, Kentarou Sawano, Ya-suhiro Shiraki, Atsushi Moriya, Yasuhiro Inokuchi, Yasuo Kunii

The 3rd Int'l Conference on Thin Film Technology and Applications (TFTA 2017)  2017.1 

STEM Moiré Observation of Lattice-Relaxed Germanium Grown on Silicon International conference

Junji Yamanaka, Chiaya Yamamoto, Hiroki Nakaie, Tetsuji Arai, Keisuke Arimoto, Kosuke O. Hara, Kiyokazu Nakagawa

The 3rd Int'l Conference on Thin Film Technology and Applications (TFTA 2017)  2017.1 

TEM and STEM Observations of a Flat Continuous Silicon-Germanium Thin Film Epitaxially Grown on Porous Silicon International conference

Junji Yamanaka, Noritaka Usami, Sevak Amtablian, Alain Fave, Mustapha Lemiti, Chiaya Yamamoto, Kiyokazu Nakagawa

The 3rd Int'l Conference on Thin Film Technology and Applications (TFTA 2017)  2017.1 

STEM Moiré Observation of Ge/Si Produced by MBE and New Heating Method Using Plasma Technique Invited International conference

Junji YAMANAKA, Chiaya YAMAMOTO, Kosuke O. Hara, Keisuke ARIMOTO, Kiyokazu NAKAGAWA

2016 Global Research Efforts on Energy and Nanomaterials (GREEN 2016)  2016.12 

The Influence of Stress-Induced Twins upon Surface Morphology of SiGe/Si(110) International conference

J. Yamanaka,M. Shirakura,C. Yamamoto,N. Utsuyama,K. Sato,T. Yamada,K. Arimoto,K. Nakagawa

The 18th International Conference on Crystal Growth and Epitaxy ICCGE-18  2016.8 

The Influence of Stress-Induced Twins upon Surface Morphology of SiGe/Si(110) International conference

J. Yamanaka, M. Shirakura, C. Yamamoto, N. Utsuyama, K. Sato, T. Yamada, K. Arimoto, K. Nakagawa

The 18th International Conference on Crystal Growth and Epitaxy ICCGE-18  2016.8 

Ge/Si および SiGe/Si の STEM モアレ観察

山中淳二、山本千綾、上村和貴、中家大希、荒井哲司、有元圭介、中川清和、澤野憲太郎

日本顕微鏡学会　第72回学術講演会  2016.6  日本顕微鏡学会

Ge/Si および SiGe/Si の STEM モアレ観察

山中淳二, 山本千綾, 上村和貴, 中家大希, 荒井哲司, 有元圭介, 中川清和, 澤野憲太郎

日本顕微鏡学会 第72回学術講演会  2016.6  日本顕微鏡学会

STEM and TEM observations of defects distribution of Ge/Si annealed by new heating method using plasma technique Invited International conference

Junji YAMANAKA,Chiaya YAMAMOTO ,Kazuki KAMIMURA ,Hiroki NAKAIE ,Tetsuji ARAI,Keisuke ARIMOTO,Kiyokazu NAKAGAWA

THERMEC’2016 International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS Processing, Fabrication, Properties, Applications  2016.5 

STEM and TEM observations of defects distribution of Ge/Si annealed by new heating method using plasma technique Invited International conference

Junji YAMANAKA, Chiaya YAMAMOTO, Kazuki KAMIMURA, Hiroki NAKAIE, Tetsuji ARAI, Keisuke ARIMOTO, Kiyokazu, NAKAGAWA

THERMEC’2016 International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS Processing, Fabrication, Properties, Applications  2016.5 

Modification of the electrical properties of BaSi2 films by alkali-metal-fluoride treatment

PVSEC2525th international Photovoltaic Science and Engineering Conference and Exhibi, tion  2015.11 

Modification of the electrical properties of BaSi2 films by alkali-metal-fluoride treatment

Kosuke O. Hara, Weijie Du, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, Kaoru Toko, Takashi Suemasu, Noritaka Usami

PVSEC2525th international Photovoltaic Science and Engineering Conference and Exhibi, tion  2015.11 

TEM observation of defects induced into semiconductor thin films under the control International conference

Junji Yamanaka, Chiaya Yamamoto, Kentarou Sawano, Keisuke Arimoto, Kiyokazu Nakagawa

the 2015 International Symposium for Advanced Materials Research  2015.8 

Role of low-energy ion irradiation in the formation of aluminum germanate layer on germanium substrate by radical-enhanced atomic layer deposition

ISSP2015: The 13th International Symposium on Sputtering & Plasma Processes  2015.7 

Role of low-energy ion irradiation in the formation of aluminum germanate layer on germanium substrate by radical-enhanced atomic layer deposition

T. Yokohira, K. Yanachi, D. Yamada, C. Yamamoto, B. Yoo, J, Yamanaka,T, Sato, T, Takamatsu, H. Okamoto, Y. Fukuda

ISSP2015: The 13th International Symposium on Sputtering & Plasma Processes  2015.7 

Formation mechanism of aluminum germanate layer on germanium substrate by radical-enhanced atomic layer deposition

8th International Workshop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"  2015.1 

Formation mechanism of aluminum germanate layer on germanium substrate by radical-enhanced atomic layer deposition

Hiroshi Okamoto, Tomoya Yokohira, Kosei Yanachi, Chiaya Yamamoto, Byeonghaku Yoo, Junji Yamanaka, Tetsuya Sato, Toshiyuki Takamatsu, Yukio Fukuda

8th International Workshop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"  2015.1 

歪みSi/Si1-XCx/Si(001)構造の不純物活性化過程における結晶性及び電気特性評価

第75回応用物理学会秋季学術講演会  2014.9 

Formation of Metal Germanate Interlayer for High-k/Ge Metal-oxide-semiconductor structures by Atomic Layer Deposition Assisted by Microwave-generated Atomic Oxygen

ALD2014, 14th International Conference on Atomic Layer Deposition  2014.6 

Formation of Metal Germanate Interlayer for High-k/Ge Metal-oxide-semiconductor structures by Atomic Layer Deposition Assisted by Microwave-generated Atomic Oxygen

Yohei Otani, Kosei Yanachi, Hiroki Ishizaki, Chiaya Yamamoto, Junji Yamanaka, Tetsuya Sato, Toshiyuki Takamatsu, Hiroshi Okamoto, Yukio Fukuda

ALD2014, 14th International Conference on Atomic Layer Deposition  2014.6 

In situ formation of aluminum germanate interlayer for high-k/Ge metal-oxide-semiconductor structure by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen

International Symposium on Sputtering and Plasma Processes (ISSP) ISSP 2013  2013.6 

In situ formation of aluminum germanate interlayer for high-k/Ge metal-oxide-semiconductor structure by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen

T. Hanada, K. Yanachi, H. Ishizaki, Y. Otani, C. Yamamot, J, Yamanaka, T, Sato, T, Takamatsu, Y. Fukuda

International Symposium on Sputtering and Plasma Processes (ISSP) ISSP 2013  2013.6 

In Situ Formation of Hafnium Silicate on Si Substrate by Atomic Layer Deposition with Tetrakis(dimethylamino)hafnium and Microwave-Generated Atomic Oxygen

The 8th International Conference on Silicon Epitaxy and Heterostructures (ICSI-8)  2013.6 

In Situ Formation of Hafnium Silicate on Si Substrate by Atomic Layer Deposition with Tetrakis(dimethylamino)hafnium and Microwave-Generated Atomic Oxygen

Hiroki Ishizaki, Yohei Otani, Chiaya Yamamoto, Junji Yamanaka, Tetsuya Sato, Toshiyuki Takamatsu, Yukio Fukuda

The 8th International Conference on Silicon Epitaxy and Heterostructures (ICSI-8)  2013.6 

選択エッチングとFE-SEM を活用したFe-Al-Ni合金中B2 析出物の形態観察 Major achievement

山本千綾,山中淳二,久野泰弘,土井稔

日本顕微鏡学会第69回学術講演会  2013.5 

Fe基およびNi基合金における2段階相分離挙動

土井 稔,久野泰弘,波多 聰,中島英治,小隈龍一郎,松村 晶,山中淳二

日本金属学会2012年秋期(第151回)大会  2012.9  日本金属学会

マイクロ波リモートプラズマを用いた原子堆積法によるGe基板上へのAl2O3薄膜の直接形成

花田毅広,梁池昂生,関渓太,滝澤蓮,石崎博基,王谷洋平,山本千綾,山中淳二,佐藤哲也,福田幸夫

2012年 秋季 第73回応用物理学会学術講演会  2012.9 

Enhanced Carrier Activation by B and Sb/P Doping for Ge CMOSFET

2012International Conference on Solid State Device and Materials  2012.9 

Fe基およびNi基合金における2段階相分離挙動

土井 稔, 久野泰弘, 波多 聰, 中島英治, 小隈龍一郎, 松村 晶, 山中淳二

日本金属学会2012年秋期(第151回)大会  2012.9  日本金属学会

Enhanced Carrier Activation by B and Sb/P Doping for Ge CMOSFET

Tetsuji UENO, Hidenori Miyoshi, Yoshihiro Hirota, Junji Yamanaka, Keisuke Arimoto, Kiyokazu Nakagawa, Yusuke Hoshi, Yasuhiro Shiraki, Takanobu Kaitsuka

2012International Conference on Solid State Device and Materials  2012.9 

Microstructure Change of Si0.99C0.01 Thin Films Caused by Arsenic-Ion-, Boron-Ion-, and Silicon-Ion-Implantation and Successive Rapid Thermal Annealing Treatment International conference

Shigenori Inoue,その他8名

7th International Conference on Si Epitaxy and Heterostructures (ICSI-7)  2011.8 

Microstructure Change of Si0.99C0.01 Thin Films Caused by Arsenic-Ion-, Boron-Ion-, and Silicon-Ion-Implantation and Successive Rapid Thermal Annealing Treatment International conference

Shigenori Inoue, その

7th International Conference on Si Epitaxy and Heterostructures (ICSI-7)  2011.8 

Microstructure Change of B2 Precipitates in an Fe-Al-Ni Alloy Due to Two-Step Heat-Treatment Invited International conference Major achievement

Junji Yamanaka,Chiaya Yamamoto,Yasuhiro Kuno,Minoru Doi

THERMEC’2011, International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS  2011.8 

Microstructure Change of B2 Precipitates in an Fe-Al-Ni Alloy Due to Two-Step Heat-Treatment Invited International conference

Junji Yamanaka, Chiaya Yamamoto, Yasuhiro Kuno, Minoru Doi

THERMEC’2011, International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS  2011.8 

Electron Mobility in Strained Si-nMOSFET Formed on Vicinal Si(110) Substrate

ICMAT 2011, International Conference on Materials for Advanced Technologies  2011.6 

Epitaxial Growth and Microstructure Observation of a Flat Continuous Silicon-Germanium Thin Film on Porous Silicon International conference Major achievement

Junji Yamanaka,Noritaka Usami,Sevak Amtablian,Alain Fave,Mustapha Lemiti,その他3名

ICMAT 2011, International Conference on Materials for Advanced Technologies  2011.6 

Selective Heating Method for Poly-crystallization of Amorphous Si Using Hydrogen Microwave Plasma

ICMAT 2011, International Conference on Materials for Advanced Technologies  2011.6 

Epitaxial Growth and Microstructure Observation of a Flat Continuous Silicon-Germanium Thin Film on Porous Silicon International conference

Junji Yamanaka, Noritaka Usami, Sevak Amtablian, Alain Fave, Mustapha Lemiti, その他

ICMAT 2011, International Conference on Materials for Advanced Technologies  2011.6 

Formation of Compressively Strained Si/Si1-xCx/Si(100) Heterostructure Using Gas-source MBE

ICMAT 2011, International Conference on Materials for Advanced Technologies  2011.6 

ガスソースMBE 法による圧縮歪みSi/緩和Si1-XCX/Si ヘテロ構造の形成

古川洋志,有元圭介,山中淳二,中川清和,宇佐美徳隆

第58 回応用物理学関係連合講演会  2011.3 

圧縮歪みSiGe/Si(110)ヘテロ構造の形成と素子応用

小幡智幸,有元圭介,山中淳二,中川清和,澤野憲太郎,その他1名

第58 回応用物理学関係連合講演会  2011.3 

Si(100)基板上に形成したSiO2/歪みSi1-xCx 構造の界面準位密度評価

矢崎 祐耶,古川 洋志,井上 樹範,有元 圭介,山中 淳二,その他5名

第58 回応用物理学関係連合講演会  2011.3 

Microstructure Change of As-ion, B-ion, and Si-ion implanted Si0.99C0.01 Thin Films by Thermal Annealing

Shigenori Inoue,Keisuke Arimoto,Junji Yamanaka,Kiyokazu Nakagawa,Kentarou Sawano,その他4名

5th International WorkShop on New Group IV Semiconductor Nanoelectronics  2010.1 

THERMAL STABILITY OF NANO-SIZED NICKEL PARTICLES ON ALUMINA SYNTHESIZED BY SOLUTION-SPRAYING PLASMA METHOD International conference Major achievement

J. Yamanaka,M. Kimura,C. Yamamoto,H. Yamashita,H. Uchida,その他1名

THERMEC’2009, International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS, Processing, Fabrication, Properties, Applications  2009.8 

PHASE-SEPARATION OF B2 PRECIPITATES IN AN Fe-Ni-Al ALLOY

Y. Kuno,Y. Nakane,T. Kozakai,M. Doi,J. Yamanaka,その他2名

THERMEC’2009, International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS, Processing, Fabrication, Properties, Applications  2009.8 

THERMAL STABILITY OF NANO-SIZED NICKEL PARTICLES ON ALUMINA SYNTHESIZED BY SOLUTION-SPRAYING PLASMA METHOD International conference

J. Yamanaka, M. Kimura, C. Yamamoto, H. Yamashita, H. Uchida, その

THERMEC’2009, International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS, Processing, Fabrication, Properties, Applications  2009.8 

PHASE-SEPARATION OF B2 PRECIPITATES IN AN Fe-Ni-Al ALLOY

Y. Kuno, Y, Nakane,T. Kozakai, M. Doi, J. Yamanaka, その

THERMEC’2009, International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS, Processing, Fabrication, Properties, Applications  2009.8 

As+イオン注入したSi-C混晶半導体薄膜のRTA処理による組織変化

上樹範,有元圭介,山中淳二,中川清和,澤野憲太郎,その他4名

2009年春季 第56回応用物理学関係連合講演会  2009.3 

Microstructure change of an As+ ion-implanted Si0.99C0.01/Si by rapid thermal annealing Major achievement

S. Inoue,K. Arimoto,J. Yamanaka,K. Nakagawa,K. Sawano,その他4名

4th International WorkShop on New Group IV Semiconductor Nanoelectronics  2008.9 

Strain relaxation mechanism in step-graded SiGe/Si(110) structure grown at 650 - 850 °C

M. Watanabe,K. Arimoto,J. Yamanaka,K. Nakagawa,N. Usami,その他3名

The 4th Asian Conference on Crystal Growth and Crystal Technology  2008.5 

Selective and Rapid Heating Method for Polycrystallization of Amorphous Si Using Microwave Plasma Irradiation

S. Ashizawa,S. Ariizumi,M. Mitsui,K. Arimoto,J. Yamanaka,その他5名

4th International SiGe Technology and Device Meeting  2008.5 

シリコン基板上に成長したシリコン・カーボン混晶薄膜の熱的安定性

井上樹範,佐藤元樹,伊藤章弘,有元圭介,山中淳二,他4名

応用物理学関係連合講演会  2008.3 

非晶質Si薄膜のNi誘起結晶化のAr+イオン注入による促進効果

三井実,堀江忠司,山中淳二,有元圭介,澤野憲太郎,他2名

日本金属学会2007年秋期(第141回)大会  2007.9  日本金属学会

Microstructure difference of Ni induced poly-crystallized SiGe by changing annealing atmosphere, and enhancement of Ni induced poly-crystallization of Si by Ar ion-implantation International conference Major achievement

J. Yamanaka,T. Horie,M. Mitsui,K. Arimoto,K. Nakagawa,他5名

Program and Abstracts of Fifthth International Conference on Silicon Epitaxy and Heterostructures (ICSI-5)  2007.5 

Microstructure difference of Ni induced poly-crystallized SiGe by changing annealing atmosphere, and enhancement of Ni induced poly-crystallization of Si by Ar ion-implantation International conference

J. Yamanaka, T. Horie, M. Mitsui, K. Arimoto, K. Nakagawa

Program and Abstracts of Fifthth International Conference on Silicon Epitaxy and Heterostructures (ICSI-5)  2007.5 

金属誘起固相成長法における雰囲気の影響

堀江忠司,三井実,有元圭介,山中淳二,中川清和,澤野憲太郎,白木靖寛,森谷智一,土井稔

2007年春季 第54回応用物理学関係連合講演会  2007.3 

金属誘起固相成長法により形成された多結晶Si薄膜のTEM観察

堀江忠司,三井実,有元圭介,山中淳二,中川清和

日本セラミックス協会第19回秋季シンポジウム  2006.9 

SiGe歪み細線構造の形成

清水香奈,有元圭介,山中淳二,中川清和,宇佐美徳隆,澤野憲太郎,白木靖寛

2006(平成18)年秋季第67回応用物理学会学術講演会  2006.8 

イオン注入を利用して作製した歪緩和SiGe/Si中の転位の分布

山中淳二,鈴木久美子,澤野憲太郎,福本敦之,中川清和,その他1名

日本金属学会2006年春季(第138回)講演会  2006.3 

Electron Microscopy Observations of an Amorphous Layer Formed by Femtosecond Laser Irradiation of Silicon International conference Major achievement

Junji Yamanaka,Travis Crawford,Gianluigi Botton,Harold Haugen

Eighth International Conference on Laser Ablation (COLA 2005)  2005.9 

Electron Microscopy Observations of an Amorphous Layer Formed by Femtosecond Laser Irradiation of Silicon International conference

Junji Yamanaka, Travis Crawford, Gianluigi Botton, Harold Haugen

Eighth International Conference on Laser Ablation (COLA 2005)  2005.9 

Strain Relaxation Mechanism of a SiGe Thin Film Grown on an Ion-Implanted Si Substrate Major achievement

Junji Yamanaka,Kentaro Sawano,Kumiko Suzuki,Kiyokazu Nakagawa,Yusuke Ozawa,その他2名

Fourth International Conference on Silicon Epitaxy and Heterostructures (ICSI-4)  2005.5 

Determination of Lattice Parameters of Strained-Si/SiGe Heterostructures Grown on Si(110) Substrates International conference

Keisuke Arimoto,Junji Yamanaka,Kiyokazu Nakagawa,Kentarou Sawano,Yasuhiro Shiraki,その他2名

Fourth International Conference on Silicon Epitaxy and Heterostructures (ICSI-4)  2005.5 

Transport Properties of SPC-Poly SiGe Crystallized at 700C and GSMBE-Poly SiGe Grown at 600C

Minoru Mitsui,Keisuke Arimoto,Junji Yamanaka,Kiyokazu Nakagawa,Kentarou Sawano,その他2名

Fourth International Conference on Silicon Epitaxy and Heterostructures (ICSI-4)  2005.5 

Determination of Lattice Parameters of Strained-Si/SiGe Heterostructures Grown on Si(110) Substrates International conference

Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, Kentarou Sawano, Yasuhiro Shiraki, その他

Fourth International Conference on Silicon Epitaxy and Heterostructures (ICSI-4)  2005.5 

Si(110)基板上のSiGe 薄膜の結晶構造解析（2）

有元圭介,山中淳二,中川清和,澤野憲太郎,白木靖寛,その他2名

2005年(平成17年)春季第52回応用物理学関係連合講演会  2005.3 

Cuイオンを注入したLiNbO3の断面TEM観察

三井直人,山中淳二,居島薫,齊藤幸典,北原明治,他1名

2005年(平成17年)春季第52回応用物理学関係連合講演会  2005.3 

イオン注入法を利用した歪緩和SiGe薄膜の作製とそのTEM観察

鈴木久美子,山中淳二,中川清和,澤野憲太郎,小澤優介,その他3名

日本金属学会2004年秋季(第135回)講演会  2004.9 

OBSERVATION OF DISLOCATIONS IN STRAIN-RELAXED SILICON-GERMANIUM THIN FILMS WITH FLAT SURFACES GROWN ON ION-IMPLANTED SILICON SUBSTRATES International conference

J. Yamanaka,K. Sawano,K. Suzuki,Y. Ozawa,K. Nakagawa,S. Koh,Y. Shiraki,T. Hattori

The European Materials Society 2004 Spring Meeting  2004.5 

High-Quality Thin SiGe Virtual Substrates Formed on Ion-Implanted Si Substrates International conference

K. Sawano,J. Yamanaka,Y. Ozawa,K. Suzuki,K. Arimoto,S. Koh,K. Nakagawa,T. Hattori,Y. Shiraki

Second International SiGe Technology and Device Meeting  2004.5 

Changes in Elastic Deformation of Strained Si by Micro-Fabrication International conference

Keisuke Arimoto,Daisuke Furukawa,Junji Yamanaka,Kiyokazu Nakagawa,Kentarou Sawano,Shinji Koh,Yasuhiro Shiraki,Noritaka Usami

Second International SiGe Technology and Device Meeting  2004.5 

OBSERVATION OF DISLOCATIONS IN STRAIN-RELAXED SILICON-GERMANIUM THIN FILMS WITH FLAT SURFACES GROWN ON ION-IMPLANTED SILICON SUBSTRATES International conference

J. Yamanaka, K. Sawano, K. Suzuki, Y. Ozawa, K. Nakagawa, S. Koh, Y. Shiraki, T. Hattori

The European Materials Society 2004 Spring Meeting  2004.5 

Changes in Elastic Deformation of Strained Si by Micro-Fabrication International conference

Keisuke Arimoto, Daisuke Furukawa, Junji Yamanaka, Kiyokazu Nakagawa, Kentarou Sawano, Shinji Koh, Yasuhiro Shiraki, Noritaka Usami

Second International SiGe Technology and Device Meeting  2004.5 

High-Quality Thin SiGe Virtual Substrates Formed on Ion-Implanted Si Substrates International conference

K. Sawano, J, Yamanaka, Y. Ozawa, K. Suzuki, K. Arimoto, S. Koh, K, Nakagawa, T. Hattori, Y. Shiraki

Second International SiGe Technology and Device Meeting  2004.5 

制御して転位を導入し歪緩和したSiGe/SiのTEM観察

山中淳二,中川清和,鈴木久美子,澤野憲太郎,黄晋二,その他3名

日本金属学会2004年春季(第134回)講演会  2004.4 

フェムト秒パルスレーザ照射したSiおよびSi関連材料の微細組織

山中淳二,Travis Crawford,Andrzej Borowie,Martin Couillard,Gianluigi Botton,その他1名

日本金属学会2004年春季(第134回)講演会  2004.3 

小澤優介 澤野憲太郎 山中淳二 宇佐美徳隆 鈴木久美子 その他4名

イオン注入法によるSiGe緩和バッファー層の歪みゆらぎの低減

応用物理学会2004年春季講演会  2004.3 

多結晶Si1-xGex 薄膜の形成と電気伝導特性

三井実,加藤敦,有元圭介,山中淳二,中川清和,その他3名

応用物理学会2004年春季講演会  2004.3 

基板へのイオン注入と熱処理により歪緩和した SiGe/Si の TEM 観察

山中淳二,中川清和,鈴木久美子,澤野憲太郎,黄晋二,その他4名

日本金属学会第133回大会(日本金属学会2003年秋季講演会)  2003.10 

イオン注入法による超平坦な薄膜SiGe歪み緩和バッファー層の作製

小澤優介,澤野憲太郎,廣瀬佳久,黄晋二,山中淳二,その他3名

第64回応用物理学会学術講演会  2003.8 

イオン注入したSi基板とその上に育成したSiGe薄膜の構造

山中淳二,中川清和,澤野憲太郎,黄晋二,白木靖寛,その他2名

日本金属学会第132回大会  2003.3 

Observation of Cu and Fe after Irradiation by Femtosecond Laser Pulses, 14TH Canadian materials Science Conference

Junji YAMANAKA,Qiang LIU,George C. WEATHERLY,Harold K. HAUGEN

14TH Canadian materials Science Conference  2002.8 

Observation of Cu and Fe after Irradiation by Femtosecond Laser Pulses, 14TH Canadian materials Science Conference

Junji YAMANAKA, Qiang LIU, George C. WEATHERLY, Harold, K. HAUGEN

14TH Canadian materials Science Conference  2002.8 

Single- and Multi-Pulse Femtosecond Laser Irradiation of Iron, Copper, and Aluminum International conference

Qiang LIU,Junji YAMANAKA,Harold K. HAUGEN,George C. WEATHERLY

SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging  2002.5 

Single- and Multi-Pulse Femtosecond Laser Irradiation of Iron, Copper, and Aluminum International conference

Qiang LIU, Junji YAMANAKA,Harold, K. HAUGEN, George C. WEATHERLY

SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging  2002.5 

TEM OBSERVATION OF SURFACE GRAPHITIZATION AND INTERIOR MICROSTRUCTURE CHANGE ON FURAN-RESIN-DERIVED CARBON International conference

Junji Yamanaka,Eiichi Yasuda,George C. Weatherly,Yasuhiro Tanabe,

MRS 2002 Spring Meeting  2002.4 

TEM OBSERVATION OF SURFACE GRAPHITIZATION AND INTERIOR MICROSTRUCTURE CHANGE ON FURAN-RESIN-DERIVED CARBON International conference

Junji Yamanaka, Eiichi Yasuda, George C. Weatherly, Yasuhiro Tanabe

MRS 2002 Spring Meeting  2002.4 

Characteristics of Microstructures of Ni-Au and Pd-Au Alloy Films Prepared by an Evaporation Method International conference

Junji YAMANAKA,Yoshio NAKAMURA,Osamu NITTONO

8th International Conference on Rapidly Quenched and Metastable Materials  1993.8 

Characteristics of Microstructures of Ni-Au and Pd-Au Alloy Films Prepared by an Evaporation Method International conference

Junji YAMANAKA, Yoshio NAKAMURA, Osamu NITTONO

8th International Conference on Rapidly Quenched and Metastable Materials  1993.8 

2016

Total number of non-preannounced events：17  Number of main presenters：0  Number of presenters other than main person：17

2015

Total number of non-preannounced events：14  Number of main presenters：0  Number of presenters other than main person：14

2014

Total number of non-preannounced events：11  Number of main presenters：0  Number of presenters other than main person：11

2013

Total number of non-preannounced events：15  Number of main presenters：0  Number of presenters other than main person：15

2012

Total number of non-preannounced events：11  Number of main presenters：0  Number of presenters other than main person：11

2011

Total number of non-preannounced events：13  Number of main presenters：0  Number of presenters other than main person：13

2010

Total number of non-preannounced events：5  Number of presenters other than main person：5

2009

Total number of non-preannounced events：6  Number of main presenters：0  Number of presenters other than main person：6

2008

Total number of non-preannounced events：9  Number of main presenters：0  Number of presenters other than main person：9

2007

Total number of non-preannounced events：16  Number of main presenters：0  Number of presenters other than main person：16

2006

Total number of non-preannounced events：9  Number of main presenters：0  Number of presenters other than main person：9

2005

Total number of non-preannounced events：5  Number of main presenters：1  Number of presenters other than main person：4

2004

Total number of non-preannounced events：5  Number of main presenters：0  Number of presenters other than main person：5

2003

Total number of non-preannounced events：2  Number of main presenters：0  Number of presenters other than main person：2

2002

Total number of non-preannounced events：1  Number of main presenters：1  Number of presenters other than main person：0

Structural Analysis of Materials Major achievement

2022Year

Advanced Instrumental Analysis IB Major achievement

2022Year

Advanced Instrumental Analysis I A Major achievement

2022Year

Advanced Instrumental Analysis I B Major achievement

2022Year

Advanced Instrumental Analysis IA Major achievement

2022Year

Introduction to Physics Major achievement

2021Year

Advanced Instrumental Analysis IB Major achievement

2021Year

Advanced Instrumental Analysis IA Major achievement

2021Year

Advanced Instrumental Analysis IB Major achievement

2021Year

Advanced Instrumental Analysis IA Major achievement

2021Year

応用化学実験IV

2021Year  Type of subject：Professional education (undergraduate)

応用化学科教育委員が全体をとりまとめつつ、各教員各研究室で指導する授業。研究室では1名の学生を指導した。

ものづくり発展ゼミII

2021Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、２人を指導した。

応用工学実験II

2021Year  Type of subject：Professional education (undergraduate)

研究室に配属された2名の3年生への、実験指導を行った。

ものづくり基礎ゼミ

2021Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員が指導する部分と、各教員が指導する部分がある。各教員指導部分について、３名の指導を行った。

Structural Analysis of Materials Major achievement

2021Year

Mechanics Major achievement

2021Year

Physics for Solid State Materials Major achievement

2021Year

Structure and Chemistry of Crystalline Solids Major achievement

2021Year

応用工学実験I Major achievement

2021Year  Type of subject：Professional education (undergraduate)

ものづくり発展ゼミI

2021Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、２人を指導した。

応用化学基礎ゼミ

2021Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、３人を指導した。

ものづくり発展ゼミII

2020Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、２人を指導した。

応用化学実験IV

2020Year  Type of subject：Professional education (undergraduate)

応用化学科教育委員が全体をとりまとめつつ、各教員各研究室で指導する授業。研究室では1名の学生を指導した。

応用工学実験II

2020Year  Type of subject：Professional education (undergraduate)

研究室に配属された2名の3年生への、実験指導を行った。

ものづくり基礎ゼミ

2020Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員が指導する部分と、各教員が指導する部分がある。各教員指導部分について、３名の指導を行った。

ものづくり発展ゼミII

2020Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、２人を指導した。

ものづくり発展ゼミI

2020Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、２人を指導した。

応用工学実験I Major achievement

2020Year  Type of subject：Professional education (undergraduate)

応用化学基礎ゼミ

2020Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、３人を指導した。

応用化学基礎ゼミ

2019Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、３人を指導した。

応用化学実験IV

2019Year  Type of subject：Professional education (undergraduate)

応用化学科教育委員が全体をとりまとめつつ、各教員各研究室で指導する授業。研究室では1名の学生を指導した。

応用工学実験II

2019Year  Type of subject：Professional education (undergraduate)

ものづくり基礎ゼミ

2019Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員が指導する部分と、各教員が指導する部分がある。各教員指導部分について、３名の指導を行った。

ものづくり発展ゼミII

2019Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、２人を指導した。

応用化学実験IV

2019Year  Type of subject：Professional education (undergraduate)

応用化学科教育委員が全体をとりまとめつつ、各教員各研究室で指導する授業。研究室では1名の学生を指導した。

ものづくり基礎ゼミ

2019Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員が指導する部分と、各教員が指導する部分がある。各教員指導部分について、３名の指導を行った。

ものづくり発展ゼミI

2019Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、２人を指導した。

応用工学実験I Major achievement

2019Year  Type of subject：Professional education (undergraduate)

応用化学基礎ゼミ

2018Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員での教育部分と各教員による教育部分のある授業。各教員による教育部分について、2人を指導した。

応用化学実験IV

2018Year  Type of subject：Professional education (undergraduate)

応用化学科教育委員が全体をとりまとめつつ、各教員各研究室で指導する授業。研究室では1名の学生を指導した。

応用工学実験II

2018Year  Type of subject：Professional education (undergraduate)

ものづくり基礎ゼミ

2018Year  Type of subject：Professional education (undergraduate)

応用化学科関係全教員が指導する部分と、各教員が指導する部分がある。各教員指導部分について、2名の指導を行った。

応用工学実験I Major achievement

2018Year  Type of subject：Professional education (undergraduate)

応用化学基礎ゼミ

2017Year  Type of subject：Professional education (undergraduate)

ものづくり発展ゼミII

2017Year  Type of subject：Professional education (undergraduate)

ものづくり基礎ゼミ

2017Year  Type of subject：Professional education (undergraduate)

応用工学実験II

2017Year  Type of subject：Professional education (undergraduate)

ものづくり発展ゼミI

2017Year

ものづくり発展ゼミII

2016Year  Type of subject：Professional education (undergraduate)

ワインと宝石 Major achievement

2011Year  Type of subject：Common education (undergraduate)

基礎化学 Major achievement

2011Year  Type of subject：Professional education (undergraduate)

電子応用実験(E) Major achievement

2011Year  Type of subject：Professional education (undergraduate)

物理学実験(S) Major achievement

2011Year  Type of subject：Professional education (undergraduate)

クリスタルサイエンス Major achievement

2011Year  Type of subject：Common education (undergraduate)

基礎化学 Major achievement

2010Year  Type of subject：Professional education (undergraduate)

クリスタルサイエンス Major achievement

2010Year  Type of subject：Common education (undergraduate)

ワインと宝石 Major achievement

2010Year  Type of subject：Common education (undergraduate)

電子応用実験(S) Major achievement

2010Year  Type of subject：Professional education (undergraduate)

電子応用実験(E) Major achievement

2010Year  Type of subject：Professional education (undergraduate)

ワインと宝石 Major achievement

2008Year  Type of subject：Common education (undergraduate)

基礎化学 Major achievement

2008Year  Type of subject：Professional education (undergraduate)

結晶材料工学特論 Major achievement

2008Year  Type of subject：Master's (Graduate School)

電子応用実験(S) Major achievement

2008Year  Type of subject：Professional education (undergraduate)

機能性材料開発特論 Major achievement

2008Year  Type of subject：Master's (Graduate School)

クリスタルサイエンス Major achievement

2008Year  Type of subject：Common education (undergraduate)

固体材料科学特論 Major achievement

2008Year  Type of subject：Dr. (Graduate School)

電子応用実験(E) Major achievement

2008Year  Type of subject：Professional education (undergraduate)

2021

Type：Master's （Major B course）dissertations guidance

Number of people receiving guidance ：7people  (Overseas students)：0people

Graduation / pass / number of people awarded degrees ：4people  (Overseas students)：0people

Number of teachers：3people

2020

Type：Undergraduate （Major A course）graduation thesis guidance

Number of people receiving guidance ：5people 

Graduation / pass / number of people awarded degrees ：5people 

Number of teachers：3people

2020

Type：Master's （Major B course）dissertations guidance

Number of people receiving guidance ：6people 

Graduation / pass / number of people awarded degrees ：6people 

Number of teachers：3people

2019

Type：Master's （Major B course）dissertations guidance

Number of people receiving guidance ：4people 

Graduation / pass / number of people awarded degrees ：4people 

Number of teachers：3people

2018

Type：Master's （Major B course）dissertations guidance

Number of people receiving guidance ：2people 

Graduation / pass / number of people awarded degrees ：2people 

Number of teachers：3people

2018

Type：Undergraduate （Major A course）graduation thesis guidance

Number of people receiving guidance ：5people 

Graduation / pass / number of people awarded degrees ：5people 

Number of teachers：3people

2018

Type：Ph.D. dissertations guidance

Number of people receiving guidance ：2people 

Graduation / pass / number of people awarded degrees ：2people 

Number of teachers：3people

2017

Type：Undergraduate （Major A course）graduation thesis guidance

Number of people receiving guidance ：1people 

2017

Type：Master's （Major B course）dissertations guidance

Number of people receiving guidance ：1people 

日本顕微鏡学会関東支部幹事会　幹事

日本顕微鏡学会関東支部  2007.4 - 2009.3

日本顕微鏡学会関東支部評議会 評議員

日本顕微鏡学会関東支部  2007.4 - 2009.3

日本顕微鏡学会関東支部幹事会 幹事

日本顕微鏡学会関東支部  2007.4 - 2009.3

富士吉田商工会議所創造技術支援プロジェクト技術研究会第４分科会　 第４分科会専門委員 2006/04/01～

富士吉田商工会議所  2007.4 - 2008.3

平成19年度地域新生コンソーシアム研究開発事業にかかわる委員会　委員

富士吉田商工会議所  2007.4 - 2008.3

平成19年度地域新生コンソーシアム研究開発事業にかかわる委員会 委員

富士吉田商工会議所  2007.4 - 2008.3

富士吉田商工会議所創造技術支援プロジェクト技術研究会第４分科会 第４分科会専門委員 2006/04/01～

富士吉田商工会議所  2007.4 - 2008.3

日本セラミックス協会第23回関東支部研究会　大会実行委員

日本セラミックス協会関東支部  2007.4 - 2007.8

日本セラミックス協会第23回関東支部研究会 大会実行委員

日本セラミックス協会関東支部  2007.4 - 2007.8

日本金属学会会報編集委員会　委員，第5分科世話人

日本金属学会  2007.3 - 2009.3

日本金属学会会報編集委員会 委員，第5分科世話人

日本金属学会  2007.3 - 2009.3

日本セラミックス協会第19回秋季シンポジウム現地実行委員会　現地実行委員

2006.5 - 2006.9

日本セラミックス協会第19回秋季シンポジウム現地実行委員会 現地実行委員

2006.5 - 2006.9

富士吉田商工会議所創造技術支援プロジェクト技術研究会第４分科会　第４分科会専門委員

富士吉田商工会議所  2006.4 - 2007.3

富士吉田商工会議所創造技術支援プロジェクト技術研究会第４分科会 第４分科会専門委員

富士吉田商工会議所  2006.4 - 2007.3

Microscopy Society of America

応用物理学会

日本金属学会

日本顕微鏡学会

大学連携研究設備ネットワーク   委員代理  

2020.4 - 2021.3   

大学連携研究設備ネットワーク   委員代理  

2020.4 - 2021.3   

国立大学法人機器・分析センター協議会   会員  

2020.4 - 2021.3   

国立大学法人機器・分析センター協議会   会員  

2019.4 - 2020.3   

大学連携研究設備ネットワーク   西関東・甲斐地域委員  

2019.4 - 2020.3   

大学連携研究設備ネットワーク   委員代理  

2019.4 - 2020.3   

大学連携研究設備ネットワーク   西関東・甲斐地域委員  

2019.4 - 2020.3   

大学連携研究設備ネットワーク   委員代理  

2019.4 - 2020.3   

国立大学法人機器・分析センター協議会   会員  

2019.4 - 2020.3   

大学連携研究設備ネットワーク   委員代理  

2018.4 - 2019.4   

大学連携研究設備ネットワーク   委員代理  

2018.4 - 2019.4   

国立大学法人機器・分析センター協議会   会員  

2018.4 - 2019.3   

大学連携研究設備ネットワーク   西関東・甲斐地域委員  

2018.4 - 2019.3   

大学連携研究設備ネットワーク   西関東・甲斐地域委員  

2018.4 - 2019.3   

国立大学法人機器・分析センター協議会   会員  

2018.4 - 2019.3   

大学連携研究設備ネットワーク   西関東・甲斐地域委員  

2017.4   

大学連携研究設備ネットワーク   委員代理  

2017.4   

大学連携研究設備ネットワーク   西関東・甲斐地域委員  

2017.4   

大学連携研究設備ネットワーク   委員代理  

2017.4   

大学連携研究設備ネットワーク   装置管理者  

2010.4 - 2018.3   

大学連携研究設備ネットワーク   装置管理者  

2010.4 - 2018.3   

日本顕微鏡学会   関東支部評議員  

2009.4 - 2011.4   

日本顕微鏡学会   関東支部幹事  

2009.4 - 2011.3   

日本顕微鏡学会   関東支部幹事  

2007.4 - 2009.3   

日本顕微鏡学会   関東支部評議員  

2007.4 - 2009.3   

日本セラミックス協会第23回関東支部研究会発表会   大会実行委員  

2007.4 - 2007.8   

日本金属学会   会報編集委員会委員，第5分科世話人  

2007.3 - 2009.3   

日本セラミックス協会   第19回秋季シンポジウム現地実行委員会委員  

2006.4 - 2006.9   

日本セラミックス協会   第15回関東支部研究発表会，大会実行委員  

1999.7   

日本セラミックス協会   第37回セラミックス基礎科学討論会，大会実行委員  

1999.1